Materials Production Processing

Introduction to advanced materials (thin films, nanostructures and nanoparticles) processing and applications.

Objectives

Comparative bibliographic search and presentation of advanced research subjects. Formulation of elementary research proposals.

Prerequisites

None

Syllabus

Thin film deposition methods. Introduction to vacuum technology. Physical, Physicochemical and Chemical methods for the deposition of thin films and for surface modification. Evaporation and Epitaxy. PVD and ΜΒΕ. Introduction to thermal CVD. Hot and cold wall reactors. Alternative CVD methods. Comparison of CVD methods. Plasma Processing: Introduction to plasmas. Sputtering, Etching, PE-CVD, Surface Functionalization. Mechanisms and kinetics in plasma processing. Plasma reactors. Plasma diagnostics. Material structure control in plasma processing. Examples of processes for the growth of nanostructured materials and devices: Thin film silicon, Low and High-k dielectrics, Diamond-Like coatings, MEMS and NEMS, superhard coatings, surface energy control and biocompatibility, super-hydrophobic and super-hydrophilic coatings, carbon nanotubes